New atomic layer deposition valve

New atomic layer deposition valve


Swagelok Semiconductor Services Company (SSSC) has introduced its newest valve for the semiconductor industry. Now available through Swagelok"s network of independent sales and service centres, the Swagelok(r) ALD series valve is an ultrahigh-purity, pneumatically actuated valve for application in atomic layer deposition (ALD) processes - an emerging deposition technique in the semiconductor industry. To meet the stringent demands of atomic layer deposition processing - the fastest growing segment of semiconductor processing technology - Swagelok"s ALD series valve features rapid actuation speed, with valve actuation times less than 5 milliseconds; and an ultrahigh cycle life - exceeding 25 million cycles during product evaluation. The patent-pending flow setting feature enables the consistent delivery of process gas. Manufactured from 316L VIM/VAR stainless steel, the valve body is available with 1/4 inch VCR(r) and 1/4 inch and 6 mm tube butt weld end connections. Available options include a high-temperature model - rated for temperatures up to 200?C - as well as multi-port, multi-valve manifold, and modular surface mount configurations.

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