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Triple magnetron sputtering machine
Triple magnetron sputtering machine
The machine has three 3"/4?/6"magnetron sputtering cathodes and has provision for choice of DC - pulsed DC and/or RF sputtering. It has substrate rotation to give high uniformity and a quartz IR lamp based substrate heater control. It is fitted with flexibility of manual, semiautomatic or complete PLC based automation. The substrate bias capability is optional and is fitted with all safety interlocks for operator's safety.
Products from Milman Thin Film Systems Private Limited
Products from MACHINE TOOLS, POWER & HAND TOOLS Category
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