• Milman Thin Film Systems Private Limited

Plasma Ion Nitriding System

Milman Thin Film was started in 1994 with the main objective of indigenous development of frontline technologies in the area of thin films and manufacturing of finest quality physical vapour deposition equipment based on them. The company offers a plasma ion nitriding system. Features: process vacuum chamber with thermal insulation and cooling facility; novel hot retort design to enhance heat transfer and lower heat loss; three zone heating with independent PID control provides thermal uniformity; fully automatic PLC/PC based control with SCADA package to provide recipe storage, recall for process repeatability; closed loop PID based pressure control with capacitance manometer and motorised valve; precision mass flow controllers provide excellent control over gas phase chemistry for process control; pulsed DC power supply with advanced arc control and setting of peak voltage, pulse frequency and duty cycle; online fine temperature control by interactive duty cycle control during nitriding; process data base with process recipes for standard nitriding steels; and integration of dual process chamber possible to enhance productivity. Other products from the company include: pirani and inverted magnetron vacuum gauges, analog and digital vacuum gauge controller, microcontroller and CPLD based vacuum gauge controller with three/six gauges and programmable set point controller; microcontroller and CPLD based auto pump down controller, customised to any vacuum system; quartz infrared based high vacuum/ultra high vacuum compatible substrate heaters with close loop PID controller and power supply; and glow discharge plasma cleaning power supplies.