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Thin Film Resistor
Thin Film Resistor
INTRON precision thin film SIL resistor networks are made by vacuum depositing a controlled film of NiCr on high purity alumina substrate. The resistors are formed using high-resolution photolithography. The conducting traces are formed by deposited copper. The values are micro trimmed to the exact value with built in absolute and ratio tolerances. The TCR and tolerance is obtained by process capability and does not rely on a selection process. Any custom design within the manufacturing capability can be supplied.
- Analog Circuits
- Precision weighing scales
- Calibration equipment
- Testing and measuring instruments
- High Precision amplifiers
- Industrial Instrumentation
- Values available: 100 to 100 K
- Power rating per element: 0.1 W
- Maximum working voltage: 100 V
- Ratio between highest and Lowest Value: 200
- Absolute Tolerance: 0.1%, 0.2%, 0.5%, 1%
- Ratio Tolerance: 0.05% (0.02% possible)
- Absolute TCR: ± 5, 10, 25 ppm/ C
- TCR Tracking: ± 2 ppm/ C
- Operating Temperature Range: 0°C to +75°C
- Insulation Resistance: 10,000m ohm
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